| Sample scanning range |
100µm x 100µm x 15µm (±10%)
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| Scanning type by sample |
XY non-linearity 0.05 %; Z non-linearity 0.05%
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| Noise |
Noise: < 0.1 nm RMS in XY dimension in 200 Hz bandwidth with capacitance sensors on; < 0.02 nm RMS in XY dimension in 100 Hz bandwidth with capacitance sensors off; < 0.04 nm RMS Z capacitance sensor in 1000 Hz bandwidth
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| Resonance frequency |
XY: 7 kHz (unloaded); Z: 15 kHz (unloaded)
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| X, Y, Z movement |
Digital closed loop control for X, Y, Z axes; Motorized Z approach range 18 mm
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| Sample size |
Maximum 40 x 50 mm, 15 mm thickness
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| Sample positioning |
Motorized sample positioning range 5 x 5 mm
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| Positioning resolution |
1µm
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| AFM Head HE001 |
Laser wavelength: 1300nm
No registration laser influence on biological sample
No registration laser influence on photovoltaic measurements
Registration system noise: <0.03nm
Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment
Free access to the probe for additional external manipulators and probes
Top and side simultaneous optical access: planapochromat objectives 10x, NA=0.28 and 20x, NA=0.42 respectively
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| AFM Head HE002* |
Laser wavelength: 1300nm
No registration laser influence on biological sample
No registration laser influence on photovoltaic measurements
Registration system noise: <0.1nm
Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment
Free access to the probe for additional external manipulators and probes
Top and side simultaneous optical access: with planapochromat objectives, Side objective up to 100x, NA=0.7 Top objective 10x, NA=0.28 simultaneously
* With HE002 Contact and Semicontact AFM in liquid are impossible
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| Optical microscope |
Numerical aperture: up to 0.1
Magnification: on 19" monitor with 1/3" CCD from 85x to 1050x
Horizontal field of view: from 4.5 to 0.37 mm
Manual detent zoom: 12.5x (motorized zoom optional)
Stand and coarse/fine focusing unit
Capability to use planapochromat objectives 10x, NA=0.28 and 20x, NA=0.42 and 100x, NA=0.7 (depends on AFM head)
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| Liquid cell (optional) |
Sample size: 2mm thickness, 25mm diameter
Sample positioning range: 5x5mm
Positioning resolution: 1um
Cell size: 40x40x12mm
Volume of liquid: 3ml
Capability of liquid exchange
Autoclave and ultrasonic cleaning of cell parts
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| Liquid cell with temperature control (optional) |
Sample size: 2mm thickness, 25mm diameter
Heating: up to 60°C
Cooling: below room temperature down to 5°C
Sample positioning range: 5x5mm
Positioning resolution: better than 1.5um
Cell size: 40x40x12mm
Volume of liquid: 3ml
Capability of liquid exchange
Autoclave and ultrasonic cleaning of cell parts.
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| Combined Shear-force and Normal force tuning fork holder (optional) |
Compatible with tuning forks with free resonant frequency 32,768 kHz
Two types of PCBs for tuning fork fixation for shear-force and normal force operation
Piezoceramic excitation of tuning fork vibration
Integrated preamplifier for low noise
Compatible with 100x side objective for TERS\TEPL measurements
Compatible with 10x top objective.
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| Conductive AFM unit (optional) |
Current range: 100fA ÷ 10uA
3 Current ranges (1nA, 100na and 10uA) switchable from program
Voltage range: -10 ÷ +7V
RMS current noise: less than 60fA for 1nA range
Conductive to Kelvin mode switchable from program
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| Nanoindenter unit (optional) |
Maximum load: 5
Load noise floor: less than 100nN
Displacement noise floor: less than 0.2 nm
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| Compatibility with optical systems |
No interference with optical imaging due to infrared laser
Upgradeability to OmegaScope for spectroscopic, photovoltaic, SNOM and TERS & TEPL operation
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| Protection enclosure with stand for optical microscope (optional) |
Acoustic isolation: 30dB
Electrostatic shielding
Inlet and outlet fittings for environmental control connection
Focusing with micrometer screw ± 6.5mm
Micrometer reading: 10 um
Focusing sensitivity: better 1um
Fast service lift: range up to 98mm
XY positioning: ± 2mm
Optional fine focusing for 100x objective
Fine focusing 0.2mm
Micrometer reading 0.5 um
Focusing sensitivity better 0.1um
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| Humidity control system (optional) |
Relative humidity range: 10-85%
Relative humidity stability: ±1%
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| Software |
Automatic alignment of registration system
Automatic configuration and presetting for standard measuring techniques
Automatic cantilever resonance frequency adjustment
Capability to work with force curves
Macro language Lua for programming user functions, scripts and widgets
Capability to program controller with DSP macro language in real time without reloading control software
Capability to process images in coordinate space including making cross-sections, fitting and subtracting of polynomial surface up to 12 degree
FFT processing with capability to treat images in frequency space including filtration and analysis
Nanolithography and nanomanipulation
Processing up to 5000×5000 pixel images.
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| TEST |
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